微纳金属光学舆情布局制备技能及应用(3)

【31】Shengnan He, Ying Liu, Jingtao Zhu et al.. SiC/W/Ir multilayer-coated grating for enhanced efficiency in 50~100 nm wavelength range in Seya-Namioka mount［J］. Opt. Lett., 2011, 36(2): 163～165

【4】Lü Hongjun,Xie Guangjun. Design of the Quantum Encoder and Decoder Using QCA. 光学学报, 2012, 32(s1): 127001--1

中图分类号：O436.1;TN305.7

要害词

【33】Bai Liang, Zhu Jingtao, Xu Jing et al.. Multilayer film reflective mirror at 30.4 nm［J］. Acta Optica Sinica, 2009, 29(9): 2615～2618
陈梦真. 同步辐射X线光刻［J］ . 物理学成长, 1992, 12(3): 359～374

周常河. 微纳光学布局及应用［J］. 激光与光电子学成长, 2009, 46(10): 22～27

【3】A. W. Lohmann. A pre-history of computer generated holography［J］. Optics & Photonics News, 2008, 19(2): 36～47

【5】杜宇禅,李海亮,史丽娜,李春,谢常青. 32 nm节点极紫外光刻掩模的集成研制. 光学学报, 2013, 33(10): 1034002--1

【25】Dong Jianjun, Cao Leifeng, Chen Ming et al.. Study on the focus performance of micro-focus Fresnel zone plate ［J］. Acta Physica Sinica, 2008, 57(5): 3044～3047

【22】Liu Longhua, Liu Gang, Xiong Ying et al.. Fabrication of high-aspect-ratio and high-density X-ray transmission grating［J］. Optics and Precision Engineering, 2009, 17(1): 72～77

【14】邓茜,赵立新,唐燕,姚靖威,刘俊伯,胡松. 扫描积分塔尔博特光刻条纹质量影响因素模仿阐明. 光学学报, 2016, 36(12): 1205001--1

牛洁斌：中国科学院微电子研究所纳米加工与新器件集成技能研究室, 北京 100029中国科学院微电子研究所微电子器件与集成技能重点尝试室, 北京 100029

接洽人作者：谢常青(xiechangqing@ime.ac.cn)

Xie Changqing,Zhu Xiaoli,Niu Jiebing,Li Hailiang,Liu Ming,Chen Baoqin,Hu Yuan,Shi Lina. Micro- and Nano-Metal Structures Fabrication Technology and Applications[J]. Acta Optica Sinica, 2011, 31(9): 0900128

修改稿日期：2011-07-02

作者单元    点击查察

朱效立, 马杰, 曹磊峰 等. 高线密度X射线透射光栅的建造工艺［J］. 半导体学报, 2007, 28(12): 2006～2009

【30】Bin Sheng, Xiangdong Xu, Ying Liu et al.. Vacuum-ultraviolet blazed silicon grating anisotropically etched by native-oxide mask［J］. Opt. Lett., 2009, 34(8): 1147～1149

网络出书日期：--

【9】于明岩,施云波,赵士瑞,郭晓龙,徐昕伟,景玉鹏,陈宝钦. 应用微波技能抑制光刻胶图形的坍塌与黏连. 光学 周密工程, 2015, 23(1): 149-156

基金项目：国度973打算(2007CB935302)扶助课题。

李淳飞. 对微纳光子学希望的一些计谋考虑［J］. 激光与光电子学成长, 2009, 46(10): 15～21

【2】Zhou Changhe. Micro- and nano- optical structures and applications［J］. Laser & Optoelectronics Progress, 2009, 46(10): 22～27
朱效立, 马杰, 谢常青 等. 3333 lp/mm X射线透射光栅的研制［J］. 光学学报, 2008, 28(6): 1026～1030

【17】Ma Jie, Xie Changqing, Ye Tianchun et al.. Design, fabrication and test of X-ray freestanding transmission gratings［J］. Acta Physica Sinica, 2010, 59(4): 2564～2567
史丽娜：中国科学院微电子研究所纳米加工与新器件集成技能研究室, 北京 100029中国科学院微电子研究所微电子器件与集成技能重点尝试室, 北京 100029
朱伟忠, 吴衍青, 郭智 等. 大面积10000 line/mm软X射线金属型透射光栅的计划、建造与检测［J］. 物理学报, 2008, 57(10): 6386～6392

王衍斌, 唐永建, 朱效立 等. 微米柱阵列ICF埋点靶的制备［J］. 原子能科学与技能, 2011, 45(4): 452～455

李木军, 沈连婠, 赵玮 等. 靠近式光刻衍射光场的有效波前浸染纪律阐明［J］. 光学学报, 2010, 30(2): 525～530

【14】Deqiang Wang, Leifeng Cao, Changqing Xie et al.. Micro zone plates with high aspect ratio fabricated by e-beam and X-ray lithography［J］. J. Microlithography, Microfabrication, and Microsystem, 2006, 5(1): 013002

【2】王向贤,汪波,傅强,辰掉恺,胡继刚,张斗国,明海. 匀称辐照365 nm LED光源计划及其在光刻中的应用. 中国激光, 2012, 39(4): 416001--1

【5】Chen Mengzhen . Synchrotron radiation X-ray lithography［J］. Progress in Physics, 1992, 12(3): 359～374

【9】J. Reinspach, M. Lindblom, O. v. Hofsten et al.. Process development for improved soft X-ray zone plates［J］. Microelectronic Engineering, 2010, 87(5-8): 1583～1586

备注：谢常青(1971—)，男，研究员，博士生导师，中国舆情网，主要从事微纳光学布局建造及衍射元件、光学掩模应用等方面的研究。

陈宝钦. 中国制版光刻与微/纳米加工技能的希望过程回想与近况［J］. 微细加工技能, 2006, (1):1~2

收稿日期：2011-05-30

所属栏目：综述

【8】丁功明,齐月静,卢增雄,卢荣胜,周培松. 亚波长金属单狭缝填充金属条的聚焦特性研究. 激光与光电子学成长, 2014, 51(6): 62302--1

董建军, 曹磊峰, 陈铭 等. 微聚焦菲涅耳波带板聚焦特性研究 [J]. 物理学报, 2008, 57(5): 3044～3047

【16】Zhu Xiaoli, Ma Jie, Xie Changqing et al.. Fabrication of 3333 lp/mm Soft X-ray transmission gratings［J］. Acta Optica Sinica, 2008, 28(6): 1026～1030

Abstract

【4】Chen Baoqin. Development review and present situation for Chinese photomask fabrication and micro- and nano-fabrication technology［J］. Microfabrication Technology, 2006, (1): 1～2

【29】Qiu Keqiang, Xu Xiangdong, Liu Ying et al.. Design and fabrication of gold transmission phase gratings for soft X-ray［J］. Acta Physica Sinica, 2008, 57(10): 6329～6334

【3】刘仁臣,吴永刚,夏子奂,唐平林,梁钊铭. 亚微米AZO光栅及其漫透射漫衍特性. 光学学报, 2012, 32(7): 731001--1

【6】彭博方,陆海亮,王帆,许琦欣,侯文玫. 基于二维周期布局衍射的套刻丈量技能研究. 激光与光电子学成长, 2014, 51(2): 21201--1

Fabrication of micro- and nano-optical structures has been the technical bottlenecks in the development of micro- and nano-photonic devices. In order to meet the small size, high precision and wide applications requirements raised by micro- and nano-optical structure fabrication technologies, we report the electron beam/X-ray/optical mixed lithography technology for the fabrication of micro- and nano-optical structures. Home-made microlithography data processing technology is developed for the generation of complex patterns of micro- and nano-optical photonic devices, 1× high-resolution patterning of the membrane-type masks is carried out by a vector-scanned electron beam lithography tool, high-aspect-ratio micro- and nano-optical patterns are replicated by X-ray lithography, and accurate overlay between X-ray lithography and low-cost optical proximity lithography is carried out for the generation of metal ribs. The results of diffraction efficiency test and seismic experiment for free-standing X-ray gold gratings are also reported.

引用该论文

谢常青：中国科学院微电子研究所纳米加工与新器件集成技能研究室, 北京 100029中国科学院微电子研究所微电子器件与集成技能重点尝试室, 北京 100029

李海亮, 吴坚, 朱效立 等. 2000 l/mm X射线镂空透射光栅的制备研究［J］. 光学学报, 2009, 29(10): 2650～2655

【20】Changqing Xie, Xiaoli Zhu, Jia Jia. Focusing properties of hard X-ray photon sieves: three-parameter apodization window and waveguide effect［J］. Opt. Lett., 2009, 34(19): 3038～3040

田丰, 杨国光, 白剑 等. 亚微米线条的微纳光纤笔挺写技能研究［J］. 光学学报, 2010, 30(1): 206～209

【7】Joel K. W. Yang, Bryan Cord, Huigao Duan et al.. Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography［J］. J. Vac. Sci. Technol. B, 2009, 27(6): 2622～2627

靳飞飞, 朱效立, 李海亮 等. 2000 lp/mm X射线透射变栅距光栅的研究［J］. 光学学报, 2010, 30(6): 1857～1860

【19】Li Hailiang, Wu Jian, Zhu Xiaoli et al.. Fabrication and study of 2000 l/mm X-ray self-standing transmission gratings［J］. Acta Optica Sinica, 2009, 29(10): 2650～2655

【15】Zhu Xiaoli, Ma Jie, Cao Leifeng et al.. Fabrication of high-density transmission gratings for X-ray diffraction ［J］. Journal of Semiconductors, 2007, 28(12): 2006～2009